CALCINING BEHAVIOR OF OXYFLUORIDE GLASS-CERAMICS/SILICON DIOXIDE SYSTEM FOR LTCC

Peihua WANGYANG,Xiwei QI,Bo LI,Chunlei DAI,Hai GUO,Ji ZHOU
DOI: https://doi.org/10.14062/j.issn.0454-5648.2010.12.016
2010-01-01
Abstract:A SiO2-B2O3-Al2O3-AlF3-Li2O-Na2O-K2O-CaO low temperature co-fired oxyfluoride glass-ceramics/silicon dioxide system was prepared.The phase transition behavior,density and dielectric properties were studied by the X-ray diffraction,scanning electron microscopy and impedance analysis.The results show that the best calcining temperature range for this system is 750-780 ℃.The relative dielectric constant(er) and dielectric loss(tan δ) of the oxyfluoride glass-ceramics/silicon dioxide system decrease with the increasing of sintering temperature because part of the amorphous glass phase is transformed into cristobalite phase.The sample reaches the maximum bulk density(2.31 g/cm3),and the er decreases to 4.42.The tan δ also falls to approximately 3 × 10-3 at 1 GHz when the samples are calcined at 780 ℃.The system is promising as a candidate for a new dielectric material for low temperature co-fired ceramic substrate,passive integration and packaging technology.
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