Abstract:Amorphous alumina films are isotropic and have no grain boundaries, which make them have smooth surfaces, excellent properties, and wide applications in protective coatings, catalysis, and microelectronics. However, high-quality alumina films were usually prepared by vapor-phase approaches which need expensive equipment and long production time. Additionally, amorphous films are long-range disordered, which makes the study of structure–property relationships challenging. Here, a simple sol–gel method is employed to obtain high-quality amorphous Al2O3 thin films. The microstructure, morphology, and mechanical properties of amorphous Al2O3 thin films were systematically investigated. All the Al2O3 thin films heat-treated at 600–800∘C are in amorphous state with ultrasmooth surface (Ra values about 0.29–0.43 nm) and high mechanical properties (elastic modulus ∼170[Formula: see text]GPa, hardness ∼20[Formula: see text]GPa). The mechanical properties (E and H) of Al2O3 films gradually increase with the increase of heat-treating temperature. Additionally, the Al coordination of the amorphous alumina films are analyzed by solid-state NMR and correlated with the mechanical properties. The results show that in amorphous alumina, the presence of tetrahedral Al ([4]Al) and octahedral Al ([6]Al) is helpful to improve the mechanical properties, while the five-coordinated Al ([5]Al) is not conducive to improve the mechanical properties. The results demonstrate that sol–gel method is an attractive alternative to time-consuming and expensive vapor-phase approaches and are useful for scale-up to applications and research of amorphous alumina films.

Microstructures and properties of Er-doped Al2O3 thin films synthesized by ion beam assisted deposition

Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

Preparation and Photoluminescence Properties of Eu3+-Doped Al2O3 Films on Silicon Substrates by the Sol-gel Method

Microstructure, Morphology and Their Annealing Behaviors of Alumina Films Synthesized by Ion Beam Assisted Deposition

Ion beam assisted deposition of Al2O3 optical waveguides on silicon

Preparation Of Alpha-Al2o3 Thin Films By Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition And Heat Annealing

Preparation of α- Al2 O3 thin films by electron cyclotron resonance plasma-assisted pulsed laser deposition and heat annealing

Thermal Stability of Er2O3-Al2O3 Thin Films Grown on Si Substrates

Fabrication and characterization of highly luminescent Er3+:Al2O3 thin films with optimized growth parameters

Study on the luminescence and reflection spectra of Al2O 3 doped Er2O3 films on Si Substrates

Photoluminescence Properties of Er3+-doped Al2O3 Film Synthesized from Er-ion-implanted Γ-Alooh Xerogel

Sensitization of Er3+ Ions in Silicon Rich Oxynitride Films: Effect of Thermal Treatments

Annealing Effects on the Structure and Electrical Characteristics of Amorphous Er 2 O 3 Films

Influence of Growth Parameters on the Microstructures of Erbium Films Deposited on Si(111) Substrates

Annealing temperature dependence of Er3+ photoluminescence in alternately Er-doped Si-rich Al2O3 multilayer film

The Microstructure, Morphology, and Mechanical Properties of Sol-Gel-derived Amorphous Aluminum Oxide Films

Sensitizing Properties of Luminescence Centers on the Emission of Er3+ in Si-Rich Sio2 Film

Microstructure and Electrical Properties of Al-doped ZnO Thin Films

Structural and Luminescence Properties of Er‐Doped Zinc–Alumino–Silicate Glass Ceramic

Impact of deposition temperature on microstructure and properties of erbium oxide antireflective films deposited on CVD diamond substrates

Optical Constants of Er2O3-Al2O3 Films Studied by Spectroscopic Ellipsometry