Microstructure, Morphology and Their Annealing Behaviors of Alumina Films Synthesized by Ion Beam Assisted Deposition

QY Zhang,WJ Zhao,PS Wang,L Wang,JJ Xu,PK Chu
DOI: https://doi.org/10.1016/s0168-583x(03)00762-6
2003-01-01
Abstract:Alumina films have been synthesized by ion beam assisted deposition (IBAD). X-ray photoelectron spectroscopy (XPS) and Rutherford back-scattering (RBS) analysis show that films synthesized by IBAD are stoichiometrical Al2O3 films. Transmission electron microscopy (TEM), atomic force microscopy (AFM), and X-ray diffraction analysis (XRD) have been applied to characterize the microstructures and morphologies of Al2O3 films and their annealing behaviors. We have found that the films are dominated by amorphous Al2O3 phase when the substrate temperatures are lower than 500 °C. The path of phase transition of film is amorphous Al2O3→800°C/6hrgamma-Al2O3→1000°C/6hγ-Al2O3+α-Al2O3→1200°C/2hα-Al2O3. The film morphology is related with the phase transition of films during annealing.
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