Strain accumulation in InAs/In x Ga 1− x As quantum dots

Lu Wang,Meicheng Li,Wenxin Wang,Haitao Tian,Zhigang Xing,Min Xiong,Liancheng Zhao
DOI: https://doi.org/10.1007/s00339-010-6120-3
2011-01-01
Applied Physics A
Abstract:The effect of strain accumulation in the InAs/In x Ga 1− x As quantum dots (QDs) system was studied in this work. It was found that strain in the In x Ga 1− x As layer accumulation in the QD layer. This effect resulted in a dramatic reduction of growth mode transition thickness of the QD layer. For InAs/In 0.25 Ga 0.75 As QDs, critical thickness is measured to be as low as 1.08 ML. The experimental results in this work highlight the importance of strain accumulation in the design and fabrication of QD-based devices with metamorphic buffer layer involved.
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