High Conductivity Intrinsic Nanocrystalline Silicon Film and As Buffer Layer in Thin Film Solar Cells

CUI Min,ZHANG Wei-jia,ZHONG Li-zhi,WU Xiao-wen,WANG Tian-min,LI Guo-hua
DOI: https://doi.org/10.3969/j.issn.1001-2028.2006.04.016
2006-01-01
Abstract:Intrinsic nanocrystalline silicon films(nc-Si:H)were prepared through plasma enhanced chemical vapor deposition(PECVD).The films' structure and surface topography were measured with Raman spectrum and atom force microscope(AFM),and films' room temperature conductivity was tested.The results show that high quality nc-Si:H films are prepared with conductivity of 4.9 S·cm-1.And PIN solar cell with nc-Si:H film as intrinsic thin-layer is prepared,the solar cell's structure is ITO/n+-nc-Si:H/i-nc-Si:H/p-c-Si/Ag.The cell's performances are measured and its open-circuit voltage Voc is 534.7 mV,short-circuit current Isc is 49.24 mA(3 cm2)and fill factor is 0.422 8.
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