Abstract:Boron carbonitride (BCN) films were deposited by d.c. unbalanced magnetron sputter deposition where a substrate bias ranging from -50 V to -300 V was applied to the sample. X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy were used to confirm the composition and bonding structure of the BCN films. Surface morphology and roughness were analyzed by atomic force microscopy. The nano-mechanical properties and nano-scratch behavior of the prepared films were determined by a nano-indentation system equipped with continuous stiffness measurement and lateral-force measurement attachments. The results indicate that there is little change in the content of B, C, and N. The films deposited are compounds with hybridized B-C-N bonds and the disordered degree of the structure increases with increasing the substrate bias. The substrate biasing can enhance the nanohardness, elastic modulus, nano-scratch resistance, and cohesion strength of the deposited films. During the nano-scratch test, plastic deformation and ploughing wear appears for the BCN films deposited at lower bias. Elastic deformation becomes the dominant deformation mechanism for the films deposited at higher bias. The coefficient of friction between the deposited BCN films and the diamond tip depends on the loading critical load. The increasing of the substrate bias leads to the improvement of the critical load and the elastic deformation proportion.

Investigation of BCN Films Deposited at Various$hboxN_2/hboxAr$Flow Ratios by DC Reactive Magnetron Sputtering

Composition and Structure of BCN Films Prepared by Ion Beam-Assisted Pulsed Laser Deposition

BN Films Deposited by HFPECVD and the Mechanism of the Process

Preparation of Boron Carbon Nitride Thin Films by Radio Frequency Magnetron Sputtering

Investigation of carbon nitride films by cathodic arc evaporation

Turbostratic Boron Carbonitride Films Produced by Bias-Assisted Hot Filament Chemical Vapor Deposition

Mechanical Properties and Bonding Structure of Boron Carbon Nitride Films Synthesized by Dual Ion Beam Sputtering

Synthesis of Boron Carbonitride Films by Plasma-Based Ion Implantation

Effect of Carbon Content on Thermal Stability of BCN Thin Film Prepared by Arc Enhanced Reactive Magnetron Sputtering Method

Optical & Electronic Properties of Carbon Nitride Thin Films

A Study of Nano-Mechanical Properties and Nano-Scratch Behavior of Boron Carbonitride Films.

Magnetron sputter deposition of boron carbide in Ne and Ar plasmas

Correlation Between Structure and Hardness of Magnetron Sputtering Deposited CNx Films

Synthesis of BCN thin films by nitrogen ion beam assisted pulsed laser deposition from a B4C target

Effect of Target Power and Bias on the Composition and Microstructure of BCN Films

Investigation of Carbon Nitride Films Deposited by Ion Beam-Assisted Deposition with Low Bombarding Energy of N Ions

Microstructure And Properties Of Bcn Films

Structural and Mechanical Properties of a-BCN Films Prepared by an Arc-Sputtering Hybrid Process

Microstructure and Tribological Behavior of BCN Thin Films with Different Nitrogen Contents

Ion-beam-assisted Deposition of CNx Films

Cn(X) Films Deposited By Laser-Ablation Of Graphite Under Low-Energy Nitrogen-Ion Beam Bombardment