Abstract:An oxygen-zinc plasma and an oxygen-zinc-aluminum plasma are formed by pulsed laser ablation of a Zn target or pulsed laser co-ablation of a Zn target and an Al target in an electron cyclotron resonance (ECR) discharge-generated oxygen plasma for the deposition of ZnO and Al-doped ZnO (AZO) films. The plasmas are characterized spectroscopically by time-integrated and time-resolved optical emission spectroscopy. Both the oxygen-zinc plasma and the oxygen-zinc-aluminum plasma contain excited species originally present in the working O2 gas and energetic species ablated from the targets. The optical emission of the oxygen-zinc-aluminum plasma is abundant in the emission bands of oxygen molecular ions and the emission lines of mono-atomic oxygen, zinc and aluminum atoms and atomic ions. The time-integrated spectra as well as the time-resolved spectra of the plasma emission indicate that the oxygen species in the ECR oxygen plasma experience additional excitation by the expanding ablation plumes, and the ablated species are excited frequently when traveling accompanying the plume expansion in the oxygen plasma, making the formed plasma highly excited and very reactive, which plays an important role in the reactive growth of ZnO matrix and the in-situ doping of Al into the growing ZnO matrix. The deposited ZnO and AZO films were evaluated for composition analysis by energy dispersive X-ray spectroscopy, structure characterization by X-ray diffraction and optical transmission measurement. The deposited ZnO is slightly rich in O. The Al concentration of the AZO films can be controlled and varied simply by changing the repetition rate of the laser used for Al target ablation. Both the ZnO and the AZO films are featured with hexagonal wurtzite crystal structure and exhibit high optical transparency in a wide spectral region. Al doping results in an improvement in the ultraviolet transparency, a blue shift in the absorption edge and a widening of the band gap.

Employing Oxygen-Plasma Posttreatment to Improve the Laser-Induced Damage Threshold of ZrO_2 Films Prepared by the Electron-Beam Evaporation Method

Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation

The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition

Influence of oxygen-plasma posttreatment on the properties of SiO2 films prepared by the electron-beam evaporation method

Comparison of Laser-Induced Damage of Monolayer ZrO2 Films Preparated by PVD and Sol-Gel Methods

Experimental research of laser-induced damage of the monolayer ZrO2 PVD and sol–gel films

Modification and Laser-Damage Resistance of Zirconia Thin Films

Comparative studies of laser-induced damage of several single-layer optical films

Influence of O2 Partial Pressure on the Micro-structure of ZrO2 Thin Films by Electron Beam Evaporation

Investigation of Deposition Rate, Liquid Droplets and Surface Morphology of Zirconium Films Deposited by Pulsed Laser Ablation

Improving Oxidation Resistance and Thermal Insulation of Thermal Barrier Coatings by Intense Pulsed Electron Beam Irradiation

Studies on Micro-Structure of Nano-ZrO2 Films

Parametric Study of Zirconium Oxide Films Using Plasma‐Based Ion Implantation and Deposition

High Laser-Induced Damage Threshold HfO2 Films Prepared by Ion-Assisted Electron Beam Evaporation

Study on Improving Damage Threshold of Dielectric Films

Spectroscopic characterization of the plasmas formed during the deposition of ZnO and Al-doped ZnO films by plasma-assisted pulsed laser deposition

Effects of Oxygen Pressures on Pulsed Laser Deposition of ZnO Films

Preparation of Sol-Gel ZrO2 Films with High Laser-Induced Damage Threshold under High Temperature

Laser Remelting of Plasma-Sprayed Nanostructured Al2O3–20 Wt.% ZrO2 Coatings Onto 316L Stainless Steel

Study on pulsed laser ablation and deposition of ZnO thin films by L-MBE

Correlations Between the Oxygen Deficiency and the Laser Damage Resistance of Different Oxide Films