Columnar Growth of Crystalline Silicon Films on Aluminium-Coated Glass by Inductively Coupled Plasma CVD at Room Temperature

Wang Jin-Xiao,Qin Yan-Li,Yan Heng-Qing,Gao Ping-Qi,Li Jun-Shuai,Yin Min,He De-Yan
DOI: https://doi.org/10.1088/1674-1056/18/2/060
2009-01-01
Chinese Physics B
Abstract:Silicon films were grown on aluminium-coated glass by inductively coupled plasma CVD at room temperature using a mixture of SiH4 and H-2 as the source gas. The microstructure of the films was evaluated using Raman spectroscopy, scanning electron microscopy and atomic force microscopy. It was found that the films are composed of columnar grains and their surfaces show a random and uniform distribution of silicon nanocones. Such a microstructure is highly advantageous to the application of the films in solar cells and electron emission devices. Field electron emission measurement of the films demonstrated that the threshold field strength is as low as similar to 9.8V/mu m and the electron emission characteristic is reproducible. In addition, a mechanism is suggested for the columnar growth of crystalline silicon films on aluminium-coated glass at room temperature.
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