Silicon Carbon Nitride Cones Prepared from an Ellipsoid Microwave Plasma Chemical Vapor Deposition Reactor

WJ Cheng,JC Jiang,Y Zhang,HS Zhu,DZ Shen
DOI: https://doi.org/10.1016/j.matlet.2004.06.050
IF: 3
2004-01-01
Materials Letters
Abstract:Silicon carbon nitride (SiCN) cones were synthesized on Si wafers using an ellipsoid microwave plasma chemical vapor deposition (MPCVD) reactor with gas mixtures of CH4, SiH4, Ar, H2 and N2 as precursors. It was shown that the cones have nanometer-sized tips and their roots vary from nanometers to micrometers in sizes. The films are atomic-level hybrids composed of Si, C and N atoms. A lowest turn-on field of 0.6 V/μm as well as field emission current densities of 4.7 mA/cm2 at an applied field of 2.8 V/μm was obtained from these SiCN cones.
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