Large-Scale Production of Amorphous Silicon Oxynitride Nanowires by Nickel-Catalyzed Transformation of Silicon Wafers in NH3 Plasma

J. Zheng,X. Song,X. Li,Y. Pu
DOI: https://doi.org/10.1021/jp075313w
2008-01-01
Abstract:Amorphous silicon oxynitrides (a-SiOxNy) were prepared through thermal treatment of nickel coated silicon wafers in NH3 plasma. Ni-Si alloy nanoparticles were formed at elevated temperature and served as the Si transfer medium from silicon wafers to nanowires. Without plasma, either amorphous silica (a-SiOx) nanowires or NiO polyhedral nanoparticles were obtained. Both the active hydrogen and nitrogen species generated in the NH3 plasma were essential for a-SiOxNy nanowire formation: the former one kept the activity of the catalyst while the later one ensured efficient nitrogen incorporation. Two factors were found to be essential for nanowire growth: the elemental state of Ni and sufficient active species in the gas phase. The Fourier transformed infrared (FT-IR) and Raman spectra of the obtained a-SiNxOy nanowires were studied.
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