Abstract:Nanocrystalline diamond (NCD) films are attractive for many applications due to their smooth surfaces while holding the properties of diamond. However, their growth rate is generally low using common Ar/CH4 with or without H2 chemistry and strongly dependent on the overall growth conditions using microwave plasma chemical vapor deposition (MPCVD). In this work, incorporating a small amount of N2 and O2 additives into CH4/H2 chemistry offered a much higher growth rate of NCD films, which is promising for some applications. Several novel series of experiments were designed and conducted to tailor the growth features of NCD films by fine-tuning of the gas-phase compositions with different amounts of nitrogen and oxygen addition into CH4/H2 gas mixtures. The influence of growth parameters, such as the absolute amount and their relative ratios of O2 and N2 additives; substrate temperature, which was adjusted by two ways and inferred by simulation; and microwave power on NCD formation, was investigated. Short and long deposition runs were carried out to study surface structural evolution with time under identical growth conditions. The morphology, crystalline and optical quality, orientation, and texture of the NCD samples were characterized and analyzed. A variety of NCD films of high average growth rates ranging from 2.1 μm/h up to 6.7 μm/h were successfully achieved by slightly adjusting the O2/CH4 amounts from 6.25% to 18.75%, while that of N2 was kept constant. The results clearly show that the beneficial use of fine-tuning of gas-phase compositions offers a simple and effective way to tailor the growth characteristics and physical properties of NCD films for optimizing the growth conditions to envisage some specific applications.

Influence of the Growth Parameters on the Dielectric Loss at Microwave Frequency of Freestanding Diamond Thick Films

Influences of Sputtering Gas Pressure and Gas Flow Rate on Microwave Characteristics of Fecoalo Thin Films

Dielectric properties of diamond using an X-band microwave split dielectric resonator

Measurement Of Microwave Dielectric Properties Of Low Loss Diamond Film At Ka Band Using The Split-Cylinder Resonator Method

Measurement of Dielectric Constant of Thin Film Materials at Microwave Frequencies

Effect of Laser Ablation on Microwave Attenuation Properties of Diamond Films.

Growth and morphological studies of (100) textured diamond thin films by microwave plasma-enhanced chemical vapor deposition

Effect of qualities of MPCVD diamond film on microwave dielectric properties in K-Ka band

Influence of O2 on Growth of Diamond Films by Microwave Plasma Chemical Vapor Deposition

Evolution of High-Quality Homoepitaxial CVD Diamond Films Induced by Methane Concentration

Study on Preparation of MCT Thin Films by Radio Frequency Sputter

Study on Morphologies and Structures of Diamond Films Synthesized on Cemented Carbide Substrates

High-speed growth of high-quality polycrystalline diamond films by MPCVD

A Study of Diamond-Like Carbon Thin Films Prepared by Microwave Plasma Chemical Vapour Deposition

Effect of Microwave Power on the Composition, Structure and Performance of N-Type Doped Nano Diamond Thin Films

Smooth Thin-Film C/Diamond Membranes With Controllable Optical Band-Gaps

Microwave power and chamber pressure studies for single-crystalline diamond film growth using microwave plasma CVD

Characterization of diamond thin films deposited by a CO2 laser-assisted combustion-flame method

Microwave Dielectric Loss at Single Photon Energies and Millikelvin Temperatures

Enhanced Growth Of High Quality Single Crystal Diamond By Microwave Plasma Assisted Chemical Vapor Deposition At High Gas Pressures

Fast, Efficient Tailoring Growth of Nanocrystalline Diamond Films by Fine-Tuning of Gas-Phase Composition Using Microwave Plasma Chemical Vapor Deposition