Fast, Efficient Tailoring Growth of Nanocrystalline Diamond Films by Fine-Tuning of Gas-Phase Composition Using Microwave Plasma Chemical Vapor Deposition

Chunjiu Tang,Antonio J. S. Fernandes,Margarida Facao,Alexandre F. Carvalho,Weixia Chen,Haihong Hou,Florinda M. Costa
DOI: https://doi.org/10.3390/ma17122976
IF: 3.4
2024-06-19
Materials
Abstract:Nanocrystalline diamond (NCD) films are attractive for many applications due to their smooth surfaces while holding the properties of diamond. However, their growth rate is generally low using common Ar/CH4 with or without H2 chemistry and strongly dependent on the overall growth conditions using microwave plasma chemical vapor deposition (MPCVD). In this work, incorporating a small amount of N2 and O2 additives into CH4/H2 chemistry offered a much higher growth rate of NCD films, which is promising for some applications. Several novel series of experiments were designed and conducted to tailor the growth features of NCD films by fine-tuning of the gas-phase compositions with different amounts of nitrogen and oxygen addition into CH4/H2 gas mixtures. The influence of growth parameters, such as the absolute amount and their relative ratios of O2 and N2 additives; substrate temperature, which was adjusted by two ways and inferred by simulation; and microwave power on NCD formation, was investigated. Short and long deposition runs were carried out to study surface structural evolution with time under identical growth conditions. The morphology, crystalline and optical quality, orientation, and texture of the NCD samples were characterized and analyzed. A variety of NCD films of high average growth rates ranging from 2.1 μm/h up to 6.7 μm/h were successfully achieved by slightly adjusting the O2/CH4 amounts from 6.25% to 18.75%, while that of N2 was kept constant. The results clearly show that the beneficial use of fine-tuning of gas-phase compositions offers a simple and effective way to tailor the growth characteristics and physical properties of NCD films for optimizing the growth conditions to envisage some specific applications.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,metallurgy & metallurgical engineering
What problem does this paper attempt to address?
The problem that this paper attempts to solve is how to achieve the rapid and efficient growth of nanocrystalline diamond (NCD) films by fine - tuning the gas - phase composition. Specifically, the authors studied the effect of adding a small amount of nitrogen (N₂) and oxygen (O₂) to the methane/hydrogen (CH₄/H₂) chemical system on the growth rate of NCD films. By designing and conducting a series of experiments, the authors explored the influence of the addition amounts of N₂ and O₂ under different conditions on the growth characteristics of NCD films, in order to find a method to optimize the growth conditions of NCD films, so as to meet the requirements of specific applications. ### Main research contents: 1. **Background and motivation**: - Nanocrystalline diamond (NCD) films are attractive in many applications because of their smooth surfaces and the properties of diamond. - However, when using the common Ar/CH₄ (with or without H₂) chemical system, the growth rate of NCD films is usually low and highly dependent on the overall growth conditions, especially when using microwave plasma chemical vapor deposition (MPCVD). 2. **Research methods**: - By adding a small amount of N₂ and O₂ additives to the CH₄/H₂ chemical system, study their influence on the growth rate of NCD films. - Designed a series of experiments to customize the growth characteristics of NCD films by fine - tuning the gas - phase composition (adding different proportions of N₂ and O₂ to the CH₄/H₂ mixed gas). - Investigated the influence of growth parameters (such as the absolute amounts of N₂ and O₂ and their relative proportions, substrate temperature, microwave power) on the formation of NCD. - Conducted short - term and long - term deposition experiments to study the evolution of the surface structure over time under the same growth conditions. 3. **Experimental results**: - By fine - tuning the gas - phase composition, NCD films with a high average growth rate (from 2.1 µm/h to 6.7 µm/h) were successfully achieved. - The results show that by fine - tuning the gas - phase composition, the growth characteristics and physical properties of NCD films can be simply and effectively customized, thereby optimizing the growth conditions to meet the needs of certain specific applications. ### Key conclusions: - **Growth rate improvement**: By adding a small amount of N₂ and O₂ to the CH₄/H₂ mixed gas, the growth rate of NCD films can be significantly increased. - **Growth condition optimization**: Fine - tuning the gas - phase composition provides a simple and effective method to customize the growth characteristics and physical properties of NCD films, thereby optimizing the growth conditions. - **Application prospects**: This method provides the possibility for the industrial - scale application of large - scale uniform NCD films. ### Formula examples: - **Growth rate**: \[ \text{Growth rate}=\frac{\text{Film thickness}}{\text{Deposition time}} \] - **X - ray diffraction peak width**: \[ \text{Average particle size}=\frac{K\lambda}{\beta\cos(\theta)} \] where \( K \) is a constant (usually taken as 0.9), \( \lambda \) is the X - ray wavelength, \( \beta \) is the full width at half maximum (FWHM), and \( \theta \) is the Bragg angle. Through these studies, the authors provide new ideas and methods for the efficient growth of NCD films and lay the foundation for future industrial applications.