Effect of rapid thermal annealing on the surface properties of the microlens arrays machined on monocrystalline silicon
Xiaonan Pu,Hanheng Du,Jianghai Xu,Peng Huang,Zhiwei Zhu
DOI: https://doi.org/10.1016/j.apsusc.2024.159314
IF: 6.7
2024-01-11
Applied Surface Science
Abstract:Microstructure arrays, such as microlens arrays, play a significant role in optical systems, biomedical imaging, and telecommunications. However, the machining-induced subsurface defects deteriorate their performance and functionality. To address this issue, this study proposes a rapid thermal annealing method to heal the subsurface defects using different temperatures ranging from 200 °C to 1000 °C in a vacuum. Firstly, the ultra-precision diamond sculpturing process is employed to machine the high-quality microlens array on the monocrystalline silicon surface. Then, the effects of the rapid thermal annealing on the microlens array surface, such as surface roughness and subsurface defect, are comprehensively investigated. Experimental results show that the annealing temperature of >600 °C contributes to the decrease in surface roughness and subsurface defect. Furthermore, to reveal the healing mechanism, a molecular dynamics simulation of rapid thermal annealing is performed by controlling the bulk temperature of machined monocrystalline silicon from 500 K to 1300 K. The simulation results show that recrystallization always occurred on the interface between the amorphous layer and monocrystalline silicon substrate and the healing mechanism should be solid phase epitaxy rather than random nucleation. The research findings would contribute to fabricating the defect-free optical lens in the industry.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films