Effect of working pressure on microstructure and mechanical properties of TaN/VN bilayer nanofilms

ZHANG Xue-hua,CAO Meng,QIAO Lin,YANG Jin,LIU Tong,LI De-jun
DOI: https://doi.org/10.3969/j.issn.1002-0322.2007.02.010
IF: 4
2007-01-01
Vacuum
Abstract:TaN/VN bilayer nanofilms were prepared in FJL560CI2 ultra-high vacuum RF magnetron sputtering chamber. XRD, nano-indenter and profilometer were employed to investigate the effect of working pressure on the microstructure and mechanical properties of the films. The results showed that the nanohardness of the bilayer film is higher fhan that of the mixture of the two monolithic TaN and VN films. When the working pressure is 0.2 Pa, the hardness of TaN/VN bilayer film reaches the highest value up to 31 GPa with elastic modulus/stress optimized. It was found that the improvement of the mechanical properties of the bilayer films relates directly to the change in working pressure, thus verifying that choosing appropriate conditions for the working pressure is available to prepare high-hardness nanofilms.
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