Influence of N2 Partial Pressure on Mechanical Properties of (ti,al)n Films Deposited by Reactive Magnetron Sputtering

Tao Zhou,Pulin Nie,Xun Cai,Paul K. Chu
DOI: https://doi.org/10.1016/j.vacuum.2009.01.001
IF: 4
2009-01-01
Vacuum
Abstract:The influence of the nitrogen partial pressure Oil the mechanical properties of (Ti,Al)N films deposited by DC reactive magnetron sputtering using a Ti-Al mosaic target at a substrate bias of - 100 V is investigated. Nanoindentation tests reveal that with increasing N-2 partial pressure, the film hardness and elastic modulus increase initially and then decrease afterwards. The maximum hardness and elastic modulus are 43.4 GPa and 430.8 Gila. respectively. The trend is believed to stein from the variations in the grain size and preferential orientation of the crystals in the (Ti,AI)N films fabricated at varying N2 partial pressure. The phenomenon is confirmed by results acquired using glancing angle X-ray diffraction (XRD) and energy dispersive X-ray spectroscopy (EDS). (C) 2009 Elsevier Ltd. All rights reserved,
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