On the Crystal Structure and Properties of TaN Monolithic Coatings Based on Different Targets

ZHANG Xuehua,CAO Meng,YANG Jin,LIU Tong,LI De-jun
DOI: https://doi.org/10.3969/j.issn.1671-1114.2007.01.004
2007-01-01
Abstract:Two kinds of TaN monolithic coatings with TaN and Ta as sputtering targets on monocrystal Si chip were prepared by using FJL560CI2 ultra-high vacuum radio freqency magnetron sputtering chamber.XRD,Nano indenter and profiler were employed to investigate the influence of the TaN target on microstructure,mechanical properties of the coatings.The results showed that TaN coatings based on TaN target had higher nanohardness than the ones based on Ta target.When the work pressure was 0.4 Pa,the highest hardness of TaN coating reached to 35.4 GPa.The coating based on TaN target at this condition possessed more excellent hardness,elastic modulus,fracture resistance than the ones using Ta target.
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