Design of a High-Adhesion-strength and High-Toughness Ta/Ta(N) Multilayer Coating and Exploration of the Influence Exerted by Ta(N) Layer Thickness

Xiaoyun Ding,Menghui Cui,Yong Lian,Jinchao Jiao,Jinghan Yang,Yawen Wu,Yingchun Cheng,Jin Zhang,Xiubo Tian,Chunzhi Gong
DOI: https://doi.org/10.1016/j.vacuum.2024.113929
IF: 4
2024-01-01
Vacuum
Abstract:This study utilizes the non-equilibrium characteristics of physical vapor deposition technology to prepare Ta/Ta(N) multilayer coatings with varying thicknesses of Ta(N) layers. Observations of the coatings' surface and cross-sections, phase analysis, hardness testing, and adhesion testing were conducted. The results indicate that Ta(N) layers with a high nitrogen content (∼8 at.%) can be obtained using DCMS&HiPIMS technology. As the thickness of the Ta(N) layer increases, the hardness of the coating gradually increases. However, the adhesion strength and fracture toughness gradually decrease. When the Ta layer and Ta(N) layer are 1 and 0.5 μm thick, respectively, the coating hardness reaches 10.2 GPa, and its cohesive adhesion strength exceeds 92 N. TEM results indicate that the coating's excellent performance may be attributed to the small lattice misfit between layers and the grain refinement achieved through nitrogen doping. It is anticipated that this research will provide new insights for coatings in high-load environments.
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