Study on the influence of the relative position of the polishing pad to the removal quantity in two-axis lapping/polishing mode

ZHANG Yang,LI Xiulong,XU Qinglan,ZHANG Rongzhu
DOI: https://doi.org/10.13741/j.cnki.11-1879/o4.2013.05.005
2013-01-01
Optical Technique
Abstract:In order to understand the effect of the position of polishing pad on the surface shape of the optical element during the polishing progress,the movement process of two-axis lapping/polishing is reviewed.The removal function is derived based on the Preston equation.On the basis,the influence on the distribution of the removal quantity of the pads swing and eccentric distance are researched.The result of quantitative calculation shows that,under a constant rotational speed,the removal on different circumferences of the workpiece changes along with the polishing swing increases.The removal of workpiece raises via increasing eccentricity,moreover the removal of center of rotation always stays the largest,regardless of the change of relative position between polishing and the workpiece.
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