Study on the Removal Function of Annular Polishing Pad Based on the Computer Controlled Polishing Technology

Wenbiao Zhang,Shumin Wan,Bin Lin,Xiaofeng Zhang
DOI: https://doi.org/10.4028/www.scientific.net/amm.457-458.552
2013-01-01
Applied Mechanics and Materials
Abstract:On the basis of the Preston assumption, the removal function of the annular polishing pad with the structure of the dual-rotor movement has been studied. The level of the similarity of the characteristic curve of the annular polishing pad and the Gaussian distribution has been evaluated by the tending factor. The pulse iteration method and the matrix calculation have been used to compute the residual error and the dwell time. The simulation result proved that the residual error (RMS) polished by the annular polishing pad had dropped 8.7% than that polished by the normal polishing pad with the same initial error condition, the surface quality has been improved by the new method.
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