Research on the Influence of the Material Removal Profile of a Spherical Polishing Tool on the Mid-Spatial Frequency Errors of Optical Surfaces

Zhaohao He,Kuo Hai,Kailong Li,Jiahao Yu,Lingwei Wu,Lin Zhang,Xing Su,Lisheng Cai,Wen Huang,Wei Hang

DOI: https://doi.org/10.3390/mi15050654

IF: 3.4

2024-05-16

Micromachines

Abstract:Elastic spherical polishing tools effectively conform to the polishing surface and exhibit high efficiency in the removal of materials, so they are extensively used in the sub-aperture polishing stages of optical components. However, their processing is often accompanied by significant mid-spatial frequency (MSF) errors, which critically degrade the performance of optical systems. To suppress the MSF errors generated during polishing with spherical tools, this study investigates the influence factor of MSF errors during the polishing process through an analysis of the convolution effect in material removal. A material removal profile model is established, and a uniform removal simulation is conducted to assess the influence of different shape material removal profiles on MSF errors. Simulation and experimental results show that a Gaussian-like shape material removal profile is more effective in suppressing the MSF errors during polishing compared to the "W" and trapezoidal shape material removal profiles. In addition, based on the characteristics of the RMS decreasing in a serrated trend with the decrease in path spacing, a path spacing optimization method considering the polishing efficiency is proposed to improve the polishing efficiency while controlling the MSF errors, and the effectiveness of the path spacing optimization method is verified by comparing the MSF error at the maximum theoretical path spacing and the path spacing that is less than this. Finally, the path spacing optimization method is used to polish single-crystal silicon to further illustrate its practicality.

chemistry, analytical,nanoscience & nanotechnology,instruments & instrumentation,physics, applied

What problem does this paper attempt to address?

The problem that this paper attempts to solve is: during the sub - aperture polishing process of optical surfaces, how to reduce the Mid - Spatial Frequency (MSF) error caused by elastic spherical polishing tools. MSF error can seriously affect the performance of optical systems, such as generating small - angle scattering and reducing image contrast, thus affecting the imaging quality. Therefore, the research aims to propose effective suppression methods by analyzing the influence of material removal profiles on MSF error.

Specifically, the paper mainly focuses on the following points:

1. **Problem Background**:
- In the sub - aperture polishing stage of optical components, elastic spherical polishing tools are widely used because of their high - efficiency material removal ability.
- However, this polishing process is usually accompanied by significant MSF errors, which can seriously degrade the performance of optical systems.

2. **Research Objectives**:
- Explore the influence of material removal profiles on MSF error.
- By establishing a material removal profile model and conducting uniform removal simulations, evaluate the influence of different - shaped material removal profiles on MSF error.
- Propose a method for optimizing the path spacing to improve the polishing efficiency while controlling the MSF error.

3. **Solutions**:
- **Material Removal Profile Model**: Based on the convolution effect, a material removal profile model was established, and the influence of different - shaped material removal profiles (such as "W" - shaped, trapezoidal and Gaussian - shaped) on MSF error was analyzed through simulations.
- **Path Spacing Optimization Method**: According to the influence of material removal profiles and path spacing on MSF error, a path spacing optimization method considering polishing efficiency was proposed to improve the polishing efficiency while ensuring that the MSF error is effectively controlled.

4. **Experimental Verification**:
- The effectiveness of the Gaussian - shaped material removal profile in suppressing MSF error was verified through experiments.
- The effectiveness of the proposed path spacing optimization method was further verified, indicating that at a path spacing of 0.4 mm, the RMS value can be controlled within 2 nm while improving the polishing efficiency.

In summary, the main purpose of this paper is to propose effective suppression methods by in - depth study of the influence of material removal profiles on MSF error, thereby improving the polishing quality and efficiency of optical components.