Abstract:This research reports the development of 3D carbon nanostructures that can provide unique capabilities for manufacturing carbon nanotube (CNT) electronic components, electrochemical probes, biosensors, and tissue scaffolds. The shaped CNT arrays were grown on patterned catalytic substrate by chemical vapor deposition (CVD) method. The new fabrication process for catalyst patterning based on combination of nanoimprint lithography (NIL), magnetron sputtering, and reactive etching techniques was studied. The optimal process parameters for each technique were evaluated. The catalyst was made by deposition of Fe and Co nanoparticles over an alumina support layer on a Si/SiO2 substrate. The metal particles were deposited using direct current (DC) magnetron sputtering technique, with a particle ranging from 6 nm to 12 nm and density from 70 to 1000 particles/micron. The Alumina layer was deposited by radio frequency (RF) and reactive pulsed DC sputtering, and the effect of sputtering parameters on surface roughness was studied. The pattern was developed by thermal NIL using Si master-molds with PMMA and NRX1025 polymers as thermal resists. Catalyst patterns of lines, dots, and holes ranging from 70 nm to 500 nm were produced and characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Vertically aligned CNTs were successfully grown on patterned catalyst and their quality was evaluated by SEM and micro-Raman. The results confirm that the new fabrication process has the ability to control the size and shape of CNT arrays with superior quality.

Chemical Vapor Deposition Growth of Well-Aligned Carbon Nanotube Patterns on Cubic Mesoporous Silica Films by Soft Lithography

Transferable thin films of pristine carbon nanotubes.

Selective Growth of Carbon Nanotube on Silicon Substrates

Directed growth of multiwalled carbon nanotubes from ordered porous silica structures

Patterned Growth of Well-aligned Carbon Nanotube Arrays on Quartz Substrates by Chemical Vapor Deposition

Film growth of pillars of multi-walled carbon nanotubes

Patterning and growth of carbon nanotubes on a highly structured 3D substrate surface

Lift-up Growth of Aligned Carbon Nanotube Patterns

Multi-Directional Growth of Aligned Carbon Nanotubes Over Catalyst Film Prepared by Atomic Layer Deposition

Uniform Patterned Growth of Carbon Nanotubes Without Surface Carbon

Controlled Growth, Patterning and Placement of Carbon Nanotube Thin Films

Preferential Growth of Carbon Nanotubes/Nanofibers Using Lithographically Patterned Catalysts

Facile growth of oriented SiC nanowires arrays on carbon fiber cloth via CVD

Substrate-Site Selective Growth of Aligned Carbon Nanotubes

Synthesis of Vertically Aligned Carbon Nanotube Arrays on Silicon Substrates

Rapid Growth of Well-Aligned Carbon Nanotube Arrays

Layered Growth of Aligned Carbon Nanotubes Arrays on Silicon Wafers

High-Density Growth of Single-Wall Carbon Nanotubes on Silicon by Fabrication of Nanosized Catalyst Thin Films

Nanoimprint Lithography for Next-Generation Carbon Nanotube-Based Devices

Controllable patterning and CVD growth of isolated carbon nanotubes with direct parallel writing of catalyst using Dip Pen Nanolithography

Select Pathways to Carbon Nanotube Film Growth