The Fabrication and Ultraviolet Detecting Properties of ZnMgO-based Thin Film Transistor by Laser Molecular Beam Epitaxy

Xin'an Zhang,Jingwen Zhang,Weifeng Zhang,Xun Hou

DOI: https://doi.org/10.1088/0268-1242/25/4/045026

IF: 2.048

2010-01-01

Semiconductor Science and Technology

Abstract:Bottom-gate thin film transistors (TFTs) with a ZnMgO film as the channel layer were fabricated on thermally oxidized p-type silicon substrates by laser molecular beam epitaxy. The devices exhibit good electrical properties in dark with the current on/off ratio, threshold voltage and channel mobility of 105, 6 V and 0.04 cm2 V−1 s−1, respectively. In an accumulation mode with a gate bias of 30 V, the drain current is on the order of 1 µA. However, when exposed to ultraviolet light (λ = 365 nm) with an intensity of 0.2 mW cm−2, the drain current dramatically increased to 9.4 µA and it was also shown that the photocurrent increased with the increase of photo intensity. The photo-detecting property is more remarkable under a depletion mode of −20 V gate bias with the photo-to-dark current ratio more than 104. The spectral and transient responses of the device to ultraviolet illumination were also discussed. These results may open the possibility of employing ZnMgO-based thin film transistors as UV sensors.