Abstract:Residual stresses will be formed around the mitigated site after the damaged site is irradiated by 10.6 mu m CO 2 laser. Using those mitigated sites can improve the damage resistance ability in optics, and once the reinitiating damage occurs, the damaged site will grow under the subsequence irradiation and large fracture may form around the mitigated site. In this study, the annealing temperatures 650, 750 and 850 degrees C, and time durations 6, 8, 10 and 12 h are used to anneal the samples. The sample annealed at 750 degrees C is the main research object of this study, while the sample annealed at 650 degrees C or 850 degrees C is only treated for 10 h. The differences of damage growth morphology and velocity of mitigated site on fused silica treated under those annealing conditions are investigated when it is damaged once again. Results are also compared with the damage growth behaviors of the unannealed substrate and mitigated site. It is indicated that the damage growth data still fit to an exponential curve even for the unannealed mitigated site. However, for the unannealed mitigated site, a more serious and larger size of damage site will be formed when the reinitiating damage occurs. It is mainly attributed to the fast propagation of crack under the effect of residual stress around the mitigated site. This behavior can be effectively controlled by the annealing treatment. Results show that the crack propagation behavior can be avoided when the retardation of mitigated sites is controlled in the range of 25 nm; moreover, the damage growth velocity and coefficient will gradually decrease with the increase of the annealing duration and annealing temperatures. A notable result indicates that there is no difference between the mitigated site and substrate when the retardation of mitigated sites is controlled below 10 nm, especially for the samples treated at 750 degrees C for 12 h and 850 degrees C for 10 h. Moreover, the reported investigation indicates that the stresses can still improve the damage resistance ability in optics. This is the most desirable outcome of the annealing treatment. Thus, the investigation results can provide a reference on how to analyze the effect of stress on damage growth of mitigated site and optimize the annealing parameters.

Effects of annealing parameters on transmission wavefront and damage threshold of fused silica

Effect of thermal annealing on damage growth of mitigated site on fused silica

Effect of residual stress on laser-induced damage characterization of mitigated damage sites in fused silica

Relaxation of Thermal Residual Stress in Laser Irradiated Fused Silica by Annealing Process

The Influence of Co2 Laser Local Irradiation on the Laser Damage Resistance of Fused Silica

High Temperature Thermal Behaviour Modeling of Large-Scale Fused Silica Optics for Laser Facility

Effects of CO2 Laser Irradiation on Surface Morphology and Stress Distribution of Fused Silica

Investigations on variation of defects in fused silica with different annealing atmospheres using positron annihilation spectroscopy

Effects of Thermal Annealing on Femtosecond Laser Micromachined Glass Surfaces

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Investigation on the influence of the CO2 laser parameters on the defect healing process of fused silica

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Surface Damage Mitigation of Fused Silica with CO2 Laser

Influence of Annealing on the Structure of Silica Glass

Irradiation Effects of CO2laser Parameters on Surface Morphology of Fused Silica

Material migration and damage characteristics of fused silica optical surface treated by CO 2 laser/short – pulse ultraviolet laser

The Structure Evolution of Fused Silica Induced by CO 2 Laser Irradiation

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

The Photo-Thermal Absorbing Influence on Introducing Laser-Damaging of the Fused Silica

Annealing Effects on Microstructure and Laser-Induced Damage Threshold of Quasi-Rugate Filters.

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching