Effect of residual stress on laser-induced damage characterization of mitigated damage sites in fused silica

yong jiang,xiaohui xiang,c m liu,h j wang,weixi liao,h b lv,x d yuan,r qiu,yun jung yang,w g zheng,x t zu
DOI: https://doi.org/10.1016/j.jnoncrysol.2014.11.038
IF: 4.458
2015-01-01
Journal of Non-Crystalline Solids
Abstract:The influences of residual stress on damage morphology and laser-induced damage threshold (LIDT) of mitigated sites in fused silica optical components before and after annealing are investigated. The results indicate that the cracks occur either at the inner location or at the maximum retardation location of mitigated sites once the residual stress (retardation) exceeds 26.49±1.79MPa (22.25±1.5nm). Meanwhile, the discrepancy of stress at different locations results in the fluctuation of LIDTs. The results of isochronal and isothermal annealing indicate that annealing temperature is the most important influence factor and the residual stress can be effectively controlled if the residual stress induced by the maximum CO2 laser beam is eliminated. Furthermore, the LIDT of mitigated sites can be enhanced without dramatical fluctuation and the damage growth coefficient that is sharply increasing can be avoided if the retardation of mitigated site is equal to or less than 5nm. The study demonstrates that annealing significantly improves the resistance of fused silica optics.
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