Abstract:Electrothermal vaporization (ETV) coupled to inductively coupled plasma optical emission spectrometry (ICPOES) was applied to the direct analysis of austenitic stainless steel powders using external calibration with increasing amounts of urban particulate matter (NIST 1648a) certified reference material. The method was first validated through the analysis of a reference material of free cutting steel, BCS 152/3, which was also analysed, following digestion in aqua regia, by ICPOES with external calibration using matrix-matched standard solutions. A four-step heating program, where the 30 s vaporization step was not ramped and followed a cooling step after pyrolysis, was used along with hemi-spherical graphite boats and trifluoromethane (CHF3, freon R-23) reaction gas, which resulted in sharp analyte signal peaks. Internal standardization with an argon emission line (415.859 nm) was applied throughout to compensate for sample loading effects on the plasma, improve the signal-to-background ratio and extend the linear dynamic range. Quantification limits ranged from 0.02 (Cd) to 200 (Si) mu g g(-1) in the solid using 5 mg aliquots, and are one or two orders of magnitude lower than those obtained by ICPOES with nebulization for several elements. The proposed method allowed determination of Al, Cd, Ce, Co, Cu, Mn, Pb, S, Si, Ti, V and Zn at levels in the 10 mu g g(-1) to 0.4% (m m(-1)) range, in agreement with results obtained by ICPOES following digestion. The method is suitable for alloy quality control, as it drastically reduces analysis time and cost by eliminating the acid digestion step altogether, which is quite attractive for industrial applications.

Slurry Sampling Fluorination Assisted Electrothermal Vaporization-Inductively Coupled Plasma-Atomic Emission Spectrometry for the Direct Determination of Metal Impurities in Aluminium Oxide Ceramic Powders

Direct ICP-AES Determination of Trace Impurities in Silicon Dioxide Using Fluorinating Electrothermal Vaporization with Slurry Sampling

Direct analysis of titanium dioxide solid powder by fluorination assisted electrothermal vaporization inductively coupled plasma atomic emission spectrometry

Electrothermal vaporization-inductively coupled plasma-atomic emission spectrometry for the direct determination of trace amounts of impurities in slurries of silicon carbide

Slurry Sampling of Silicon Nitride Powder Combined with Fluorination Assisted Electrothermal Vaporization for Direct Determination of Titanium, Yttrium and Aluminum by Icp-Aes

Direct Analysis of Silicon Carbide by Fluorination Assisted Electrothermal Vaporization Inductively Coupled Plasma Atomic Emission Spectrometry Using a Slurry Sampling Technique

Fluorination Assisted Slurry Electrothermal Vaporization in ICP-AES for the Direct Analysis of Silicon Dioxide Powder

Direct Determination of Trace Copper and Chromium in Silicon Nitride by Fluorinating Electrothermal Vaporization Inductively Coupled Plasma Atomic Emission Spectrometry with the Slurry Sampling Technique

In-situ Separation of the Matrix for the Direct Determination of Traces of Chromium, Cobalt, and Nickel in Titanium Dioxide Powder by Electrothermal Atomic-Absorption Spectrometry with Slurry Sampling

Fluorination Assisted Electrothermal Vaporization Inductively Coupled Plasma Atomic Emission Spectrometry: An Effective Method for Direct Determination of Refractory Elements in Solid Biological Samples

Use of Polytetrafluoroethylene Slurry for Silica Matrix Removal in ETAAS Direct Determination of Trace Cobalt and Nickel in Silicon Dioxide Powder

Direct Determination of Rare Earth Impurities in Lanthanum Oxide by Fluorination Assisted Electrothermal Vaporization Inductively Coupled Plasma Atomic Emission Spectrometry with Slurry Sampling

In-situ Electrothermal Fluorination-Assisted Matrix Removal, Slurry Sampling, Graphite Furnace Atomic Absorption Spectrometry for the Determination of Trace-Level Chromium, Cobalt and Vanadium in Zirconium Dioxide Powder

Direct Determination of Trace Elements in Micro Amounts of Biological Samples Using Electrothermal Vaporization Coupled to Icp-Aes

Comparative Studies on Chemical Modification of Polytetrafluoroethylene Slurry in ETV-ICP-AES and ETAAS

Direct Determination of Impurities in High Purity Silicon Carbide by Inductively Coupled Plasma Optical Emission Spectrometry Using Slurry Nebulization Technique

Determination of metal impurities in titanium dioxide using slurry sample introduction by axial viewing inductively coupled plasma optical emission spectrometry

Determination of Trace Metal Impurities in Cerium Oxide by Fluorination-Assisted Etv-Icp-Aes after Hplc Separation

Direct determination of trace elements in austenitic stainless steel samples by ETV-ICPOES

Direct Determination of Trace Impurities in Niobium Pentaoxide Solid Powder with Slurry Sampling Fluorination Assisted Electrothermal Vaporization Inductively Coupled Plasma Mass Spectrometry

Direct determination of trace impurities in high purity neodymium after in-situ analyte-matrix separation by fluorination assisted ETV-ICP-AES