Direct ICP-AES Determination of Trace Impurities in Silicon Dioxide Using Fluorinating Electrothermal Vaporization with Slurry Sampling

Peng Tianyou,Jiang Zucheng
DOI: https://doi.org/10.2116/analsci.13.595
IF: 1.967
1997-01-01
Analytical Sciences
Abstract:Based on the selective volatilization taking place between the matrix and the analyte in the graphite furnace, a new method for a direct ICP-AES determination of trace impurities in SiO2 powder using electrothermal vaporization (ETV) as a slurry-sampling technique is described. A polytetrafiuoroethylene (PTFE) emulsion is used as a fluorinating reagent to promote the vaporization of impurity elements from SiO2 powder. The fluorinating vaporization and transportation behaviors, the matrix effects and the particle-size effects have been investigated systematically. When the sampling volumes are 10 μl, the detection limits of Cu, Cr, Fe and Ti are 1.05,1.58, 1.06 and 0.9 μgl-1, respectively, and the RSDs are in the range of 1.9-4.1%. The proposed method has been applied to analyze SiO2 powder without any chemical pretreatment. The determined values are in good agreement with the results obtained by using acid decomposition- pneumatic nebulization ICP-AES.
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