Room Temperature Observation of Electron Resonant Tunneling Through InAs/AlAs Quantum Dots

J Sun,RY Li,C Zhao,LK Yu,XL Ye,B Xu,YH Chen,ZG Wang
DOI: https://doi.org/10.1149/1.2180529
2006-01-01
Electrochemical and Solid-State Letters
Abstract:Molecular beam epitaxy is employed to manufacture self-assembled InAs/AlAs quantum-dot resonant tunneling diodes. The resonant tunneling current is superimposed on the thermal current, and together they make up the total electron transport in devices. Steps in current-voltage characteristics and peaks in capacitance-voltage characteristics are explained as electron resonant tunneling via quantum dots at 77 or 300 K, and thus resonant tunneling is observed at room temperature in III-V quantum-dot materials. Hysteresis loops in the curves are attributed to hot electron injection/emission process of quantum dots, which indicates the concomitant charging/discharging effect. (c) 2006 The Electrochemical Society.
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