Abstract:As a pillar material of semiconductors, single-crystal silicon (Si) has attracted much attention due to its excellent electronic properties. Meanwhile, femtosecond laser processing as a convenient fabrication method for miniaturized structures provides an effective way to improve the performance of Si-based devices. However, the final-state analysis of femtosecond laser-induced Si micro-nano structures remains to be explored. In this study, the evolution of the micro-nano structures and the variation of surface and subsurface damage with pulse number were studied. Based on the atomic structure, the amorphous layer, dislocation layer, and unaffected layer were found. The amorphous layer resulted from the re-solidification of melted materials. The dislocation layer consisted of dislocations and lattice distortion. The unaffected layer retained the initial lattice structure and was not affected by laser irradiation. The high temperature and stress induced by multiple pulses led to the stacking faults and nano-twins in the subsurface layer. The evolution of the Si structure was essentially a transition process from a dislocation layer to a high-density defect layer and a transition process from nanotips to laser-induced periodic surface structures. During this process, dislocations dominated the femtosecond laser-induced microstructural deformation, affecting the nano-hardness of the irradiated surface. As a result, the nano-hardness of Si structures fabricated using femtosecond laser processing was maximally enhanced by 9.54%. This work provides new information about ultrafast laser-induced surface and subsurface damage, which is significant for the efficient and high-precision fabrication of Si-based functional micro-nano devices.

Microstructured Silicon Created with a Nanosecond Neodymium-Doped Yttrium Aluminum Garnet Laser

Laser microstructuring of Si surfaces for low-threshold field-electron emission

Silicon micro-structuring using ultra-short laser pulses

Strong Mid-Infrared Absorption and High Crystallinity of Microstructured Silicon Formed by Femtosecond Laser Irradiation in NF3 Atmosphere

Picosecond Pulse Laser Microstructuring of Silicon

Laser micro/nano machining of silicon

Black Silicon Created by Interfered Femtosecond Laser Illumination

Comparison of structure and properties of femtosecond and nanosecond laser-structured silicon

Fabrication of Micro-Nano Structure Se-doped Silicon Via Picosecond Laser Irradiation Assisted by Dopant Film

One-Step femtosecond laser irradiation of Single-Crystal Silicon: Evolution of Micro-Nano structures and damage investigation

Deposition and Melting Behaviors for Formation of Micro/nano Structures from Nanostructures with Femtosecond Pulses

Greatly enhanced infrared normal spectral emissivity of microstructured silicon using a femtosecond laser

Infrared Light Absorption and Emissivity of Silicon Microstructured by Femtosecond Laser in SF6

Effect of high-power nanosecond and femtosecond laser pulses on silicon nanostructures

Laser Induced Plasma in the Formation of Surface-Microstructured Silicon

Ytterbium femtosecond fiber laser ablation synthesis of silicon nanocrystals in water: Laser frequency and pulse energy dependence

Broad band enhanced infrared light absorption of a femtosecond laser microstructured silicon

Developing of nano sized fibrous eutectic silicon in hypereutectic Al–Si alloy by laser remelting

Progressive Evolution of Silicon Surface Microstructures Via Femtosecond Laser Irradiation in Ambient Air

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation

Surface Morphology and Infrared Absorption of Silicon Irradiated by Picosecond Laser Pulses in Sf6