Forming Process Investigation of <formula formulatype="inline"><tex>$\hbox{Cu}_{x} \hbox{O}$</tex></formula> Memory Films

hangbing lv,mingbo yin,Y. L. Song,X. F. Fu,L. Tang,peng zhou,C. H. Zhao,T. A. Tang,B. A. Chen,Y. Y. Lin
DOI: https://doi.org/10.1109/LED.2007.911619
IF: 4.8157
2008-01-01
IEEE Electron Device Letters
Abstract:The forming process, which is the first transition from fresh state to low resistance state, was investigated in CuxO memory films prepared by plasma-induced oxidation. X-ray photoelectron spectroscopy investigation of surface chemical bonds of CuxO films and Auger electron spectroscopy depth spectra show that the formation of a highly resistive CuO layer on the CuxO surface is the main reason for...
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