Two Patterning Techniques for Superconducting MgB2 Films by Wet Etching

Zhangyu ZHOU,Fashun YANG,Jian YANG,Song WANG,Chaoyong DENG,Xinghua FU
DOI: https://doi.org/10.3969/j.issn.1005-023X.2012.18.003
2012-01-01
Abstract:Effectively patterning of MgB2 thin film is a very critical step to the application of superconducting films in superconducting electronics.Two patterning techniques for superconductive MgB2 films by wet etching were presented.In the first technique the precursor boron films were patterned by using H2O2 as etchant.Then the samples were annealed in magnesium vapor in a tantalum crucible,and the patterned boron films were transformed to superconducting MgB2 films.In the second technique the MgB2 films were patterned directly by a mixture of hydrofluoric acid (HF) and nitric acid (HNO3) solutions.The patterned MgB2 films with rather high resolution were fabricated successfully by using above techniques.The transition temperature (Tc) of the patterned MgB2 films is around 38K and critical current density (Ic) is about 1 × 106 A/cm2.
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