Geometrical Modeling for Mask Refinement of Surface Micromachined MEMS Devices

ZHAO Xiaoxia,LI Jianhua,LING Hao,LIU Yusheng,GUO Weibin,HE Gaoqi
2011-01-01
Abstract:To optimize MEMS devices,incremental refinement of the MEMS masks is needed in MEMS design.In order to update geometric model of MEMS device in mask refinement,a geometry modeling method for mask refinement of surface micromachined MEMS devices was proposed.A dependency graph of MEMS device was constructed on inherent relationship of 3-D geometrical model and process model of MEMS device;and after mask refinement,inconsistent elements of the 3-D model were determined based on the dependency graph.The new geometrical model was constructed by updating inconsistent elements.In addition,parameter bound and local process simulation approaches were used in updating the geometric model with topological change in refinement.Finally,some test results were given.
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