Effect of Heat-treatment on SiO2 Optical Thin Film Prepared with Electrostatic Self-Assembly Multilayer Method
XU Pi-chi,LU Zhong-yuan,HE Fang-fang,WANG Bing
DOI: https://doi.org/10.3969/j.issn.0490-6756.2005.01.027
2005-01-01
Abstract:SiO_(2) colloidal solution were prepared, catalyzed by hydrolysis of Ethyl Silicate (Si(OC_(2)H_(5))_(4),TEOS), using NH_(3)·H_(2)O as catalyser, ethanol as solvent, the mixed liquor of ethanol and ditilled water was used to dilute the sol. The concentration of sol was 0.01g/mL, the particles of SiO_(2) in sol possesses negatives charge. Polyelectrolyte [Poly(diallyldimethylammonium chloride), PDDA] possessing positive charges and SiO_(2) complex films were fabricated on glass substrates via the electrostatic self-assembly multiplayer (ESAM) technique. SiO_(2) optic anti-reflective thin films were formed by heat-treating under different temperature less 520℃.The micro-structure, constitute, refractive index and thickness, anti-scratch intensity, laser damage threshold and light transmittance of the SiO_(2 ) films are characterized by thermal analyzer(DTA-TG), transmission electron microscopy(TEM), Fourier transform infrared(FT-IR), ellipsometry, Nd∶YAG laser damage facility 721spectrophotometer respectively. The experimental results show that the anti-scratch intensity, laser damage threshold, light transmittance are further improved after heat-treatment. PDDA /SiO_(2) complex thin film of 20 bilayers was heat-treated under 300℃ possesses the most high anti-scratch intensityand refractive index, under 400℃ possesses the most high light transmittance (99.2%)at wavelength 520nm, under 500℃ possesses the most high laser damage threshold(68J/cm~(2)).