Abstract:γ-ray radiation effect on sol-gel silica films was investigated at different absorbed doses ranging from 10 kGy to 1000 kGy. The defect and microstructure evolutions of silica films were analyzed to understand the performance degradation behavior and mechanism of the γ-ray irradiated silica films. The cracks appear on the silica film surface and further expand at larger γ-ray absorbed dose, while surface roughness slightly decreases. During γ-ray irradiation, the thermal effect and the increased rate of diffusion-controlled process lead to the condensation of Si-OH groups and the recombination of ODCs. However, the ionization of atoms leads to generation and accumulation of E′ centers and NBOHCs. γ-ray irradiation leads to the reductions of bond lengths and bond angles of Si-O-Si groups, thus causing the densification of films. The refractive index and mechanical property firstly enhance and then reduce with the increase of absorbed dose associated with the change of silica film density. After γ-ray irradiation, the decreased contact angle and increased surface free energy indicate the reduction of anti-pollution ability of silica films. The dose-dependent surface quality, defects and mechanical properties determine the variation in laser-induced damage threshold (LIDT) of silica film. The results provide a reference to control the structural damage and performance degradation of silica films, which is very important for the research of safe operation of high-power laser facilities for inertial confinement fusion (ICF).

Effect of Ammonia Treatment on Laser-induced Damage Threshold of Sol-Gel Silica Films

Effect of Ammonia Treatment on Laser-Induced Damage of Nano-Porous Silica Film

Laser-induced Damage of Sol-Gel Silica Acid and Basic Thin Films

Laser-induced damage mechanism of the sol–gel single-layer SiO2 acid and base thin films

Effect of porosity on the laser induced damage threshold of sol-gel SiO2 and ZrO2 single layer films

Effect of Ammonia Treatment Time on Contamination Resistant Capability of SiO2 AR Coatings

SiO2 Sol-Gel Films after Ammonia and Heat Two-Step Treatments

Increased Laser-Damage Resistance of Sol–Gel Silica Coating by Structure Modification

Environmental Stable SiO2 Antireflective Coating Modified via NH3/HTMS Vapor Phase Treatment

SURFACE MODIFICATION AND CONTAMINATION RESISTANCE OF SOL-GEL SiO2 DERIVED ANTIREFLECTIVE COATINGS

Laser-Induced Damage on Ordered and Amorphous Sol-Gel Silica Coatings

Sol-gel derived contamination resistant antireflective coatings

Effect of UV-Irradiation on Sol-Gel Optical Films

Preparation of Transmissive Optics Coated by Sol-gel Method With High Laser-induced Damage Threshold

Effect of Laser Conditioning on Surface Modification and Laser Damage Resistance of SiO2 Antireflection Film

Performance degradation mechanism of γ-ray irradiated sol-gel silica film

Characteristics of laser-densified and conventionally heat treated sol–gel derived silica–titania films

Influence of Porosity on Laser Damage Threshold of Sol–gel ZrO2 and SiO2 Monolayer Films

Properties of sol–gel derived scratch-resistant nano-porous silica films by a mixed atmosphere treatment

Effects of Dimethyl Formamide on Laser-Induced Damage to Sio2 Films Prepared by the Sol-Gel Method

Structural Control of Porous Silica Thin Films under Alkaline Condition