Abstract:Titanium nitride (TiN) films synthesized by multi-arc ion plating (AIP) normally have a columnar microstructure, and are likely to induce surface defects due to the formation of macroparticles and neutral particles in the vicinity of cathode arc sources. Hence, the achievable microhardness of the normal AIP TiN films only ranges between 20 similar to 30 GPa. A systematic study for fabricating an adherent nano-superhard titanium nitride (TiN) film on M2 high speed steel substrate by a vacuum cathode multi-arc ion-plating (ALP) system was initiated. To understand the relationship of the film processing-structure-property, their microhardness, film-to-substrate adhesion, frictional property, and microstructure of the film were investigated using Vickers hardometer, scratch tester, ball-on-disc tester, X-ray diffractometer, and transmission electron microscope. Results show that: (i) the achievable film microhardness ranges between 35 GPa and 45 GPa; (ii) the critical load (Lc) of the superhard TiN film is at 64 N approximately; (iii) the friction coefficient, under a high-load and a high rotating-speed, of the film is ranging from 0.5 to 0.8; and (iv) the nm scale mean main grain-sizes of the film are approximately 12.7 nm for TiN111, 19.7 nm for TiN200 and 9.6 nm for TiN220. The maximum achievable microhardness 45 GPa is more than twice of the 22 GPa for standard TiN film. Such hardness enhancement is anticipated as mainly due to: (a) the formation of nanoscaled crystalline grains; (b) the preferential orientation and growth of grains in the close-packed plane (111); and (c) the induced residual stress within the film by ion bombardment.

Influence of Shield on Properties of TiN Films Prepared by Arc Ion Plating

Microstructure and mechanical properties of TiN/TiAlN multilayer coatings deposited by arc ion plating with separate targets

Influence of distance between target and substrate on morphology and distribution of macroparticles during arc ion plating

Enhancing the Hardness of Arc-Ion-Plated Nanocrystallite Tin Films

Microstructure and Surface Properties of Ticn Films Using Cathodic Arc Deposition Enhanced by Additional Electric Field

Investigation on the Interface Preparation and Properties of PCVD TiN Film

The Study of Pd Film Layer Deposited on Surface of Pure Titanium by Arc Ion Plating Technology

Nanocrystallite Superhard Titanium Nitride Film In Multi-Arc Ion Plating

Effect of Nitrogen Protective Atmosphere on Microstructure and High Temperature Erosion Property of TiAl3 and Cr3C2 Composite Coatings

Influence of Target Current on Microstructures and Stoichiometries of TiAlN Coating Deposited by Arc Ion Plating

TiN/TiCN Multilayer Films Modified by Argon Plasma Treatment

ADHERENT NANO-SUPERHARD TITANIUM NITRIDE FILM AND ITS FORMING MECHANISM IN MULTI-ARC ION-PLATING SYSTEM

Effects of the thickness of Ti buffer layer on the mechanical properties of TiN coatings

Tribological Performances of TiAlN Film on TC4 Alloy Surface Prepared by Two Kinds of Arc Target

Wear Resistance of Arc Ion Plating Deposited TiN/AlN-TiAlN Film

High Energy Xenon Ion Beam Assisted Deposition of Tin Film and Its Industrial Application

Investigation of the characteristics of TiN-coating film deposited by arc ion plating method and the feasibility of measuring residual stress according to heat treatment

The Effects of Ion Bombarding Energy on the Structure and Properties of TiN Films Synthesized by Dual Ion Beam Sputtering

Microstructure and properties of TiCrN coatings by arc ion plating

Uniformity of thickness and surface properties of tin films deposited by vacuum arc

Ion Bombardment On The Mechanical Properties Of Ibad Tin Films .1. Effect Of Bombardment Energy On Hardness And Tribology Behaviour