Abstract:Design of photocatalyst materials for hydrogen production is of great interest due to a lack of cost-effective candidates. Titanium dioxide (TiO 2 ) is a well-known photocatalyst with good stability, reasonable photoactivity, and low cost. To improve the efficiency and selectivity, we apply a surface modification approaches using nanostructured Cerium dioxide (CeO 2 ) deposited onto TiO 2 by atomic layer deposition (ALD). The deposition of CeO 2 onto TiO 2 uses the precursor Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)cerium (IV) (Ce(TMHD) 4 ) and co-reactant ozone. The atomic layer deposition (ALD) of CeO 2 on TiO 2 was carried out by experiments with an atmospheric pressure fluidized bed ALD reactor. The TiO 2 substrate was pre-treated using a combination of ozone and humidified nitrogen flow pulses to investigate the effect of the increase of surface functional groups on CeO 2 deposition. The physicochemical properties of the obtained CeO 2 /TiO 2 photocatalysts were characterized using different methods and their photocatalytic activity was evaluated during photocatalytic hydrogen evolution reaction. We have also performed density functional theory (DFT) calculations to investigate the reaction mechanism of metal precursors Ce(TMHD) 4 and tris(methylcyclopentadienyl)cerium (III) (Ce(MeCp) 3 ) on hydroxylated rutile and anatase TiO 2 surfaces. The hydroxyl saturation coverage on different TiO 2 facets was first addressed. These facets include anatase a-TiO 2 (001) and a-TiO 2 (101) and rutile r-TiO 2 (100) and r-TiO 2 (110). Hydroxyl groups OH and H are initially binding to surface Ti and O atoms, respectively. On a-TiO 2 (001) hydroxyl recombination to form water results in a final coverage of 0.81ML, due to the shortest neighboring HO-H distance on all surfaces. The Gibbs energy is then calculated to elucidate the effect of pressure and temperature on the hydroxylated termination of TiO 2 surfaces. The final hydroxyl coverage is as follows: 0.81ML on a-TiO 2 (001) surface, 1ML on a-TiO 2 (101) and r-TiO 2 (100) surfaces, and 0.75ML on r-TiO 2 (110) surface. Two precursors (Ce(TMHD) 4 and Ce(MeCp) 3 ) are adsorbed on hydroxylated TiO 2 surfaces. After precursor adsorption and relaxation, the surface hydroxyl coverage changes with water formation. After Ce(THMD) 4 adsorbed on r-TiO 2 (100) surface, the hydroxyl coverage is decreased from 1ML to 0.25ML with 12 H 2 O molecules formation. After Ce(MeCp) 3 adsorbed on a-TiO 2 (101) surface, although the hydroxyl coverage is not changed, the hydroxyl orientation is modified, breaking the symmetry. For Ce(TMHD) 4 , direct ligand dissociation is applied to study the mechanism of eliminating the ligands. For Ce(MeCp) 3 , the ligand can be eliminated by hydrogen transfer. The barrier for hydrogen transfer is calculated using climbing image nudged elastic band (CI-NEB) method. The results show that for Ce(MeCp) 3 , the reaction is endothermic on a-TiO 2 (101) surface, but it is overall exothermic on the other three surfaces. The facets play an important role in the eliminating the ligand. We present DFT results on the activity of ceria-modified rutile TiO 2 towards water dissociation and CO 2 activation showing that this heterostructured catalyst can promote both reactions. This work will be important to reveal the mechanism and feasibility of atomic layer deposition of ceria on different TiO 2 surface facets.

Surface Acidity and Properties of TiO2/SiO2 Catalysts Prepared by Atomic Layer Deposition: UV−visible Diffuse Reflectance, DRIFTS, and Visible Raman Spectroscopy Studies

Reaction of tetrabutyl titanate in the adsorption layer on Si02 surface

Structure and optical properties of TiO2 thin films deposited by ALD method

Atomic Layer Deposition of Tio2 from Tetrakis-Dimethyl-Amido Titanium or Ti Isopropoxide Precursors and H2o

Mixed Tin-Titanium Oxides by Atomic Layer Deposition on Planar Substrates: Physical and Electronic Structure

Atomic layer deposition of TiO2 on mesoporous silica

Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass

DFT Study on Atomic Layer Deposition of Cerium Dioxide on Hydroxylated Titanium Dioxide As Efficient Photocatalyst

Surface Modification of Au/Tio2 Catalysts by Sio2 Via Atomic Layer Deposition

Properties and morphology of TiN films deposited by atomic layer deposition

Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Optical Properties of TiO2 Grown by Atomic Layer Deposition Using Various Oxidizing Agents: The Ellipsometry Analysis of Absorption Properties

Characterization of titania silicalites

Silica–Titania mixed Oxides: Si–O–Ti Connectivity, Coordination of Titanium, and Surface Acidic Properties

Surface state of NiO supported on γ-Al2O3 and TiO2/γ-Al2O3 supports

Photocatalytic oxidation and decomposition of acetic acid on titanium silicalite

[In situ diffuse reflectance FTIR spectroscopy characterization of titanium silicalite-1 catalytic oxidization of styrene]

Atomic Layer Deposition of Cerium Dioxide Film on TiN and Si Substrates: Structural and Chemical Properties

Quantum Chemical Study of the Initial Surface Reactions in Atomic Layer Deposition of TiN on the SiO(2) Surface.

Surface Alumina Species on Modified Titanium Dioxide: A Solid-State 27al MAS and 3QMAS NMR Investigation of Catalyst Supports

Tin oxide atomic layer deposition from tetrakis(dimethylamino)tin and water