Abstract:Design of photocatalyst materials for hydrogen production is of great interest due to a lack of cost-effective candidates. Titanium dioxide (TiO 2 ) is a well-known photocatalyst with good stability, reasonable photoactivity, and low cost. To improve the efficiency and selectivity, we apply a surface modification approaches using nanostructured Cerium dioxide (CeO 2 ) deposited onto TiO 2 by atomic layer deposition (ALD). The deposition of CeO 2 onto TiO 2 uses the precursor Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)cerium (IV) (Ce(TMHD) 4 ) and co-reactant ozone. The atomic layer deposition (ALD) of CeO 2 on TiO 2 was carried out by experiments with an atmospheric pressure fluidized bed ALD reactor. The TiO 2 substrate was pre-treated using a combination of ozone and humidified nitrogen flow pulses to investigate the effect of the increase of surface functional groups on CeO 2 deposition. The physicochemical properties of the obtained CeO 2 /TiO 2 photocatalysts were characterized using different methods and their photocatalytic activity was evaluated during photocatalytic hydrogen evolution reaction. We have also performed density functional theory (DFT) calculations to investigate the reaction mechanism of metal precursors Ce(TMHD) 4 and tris(methylcyclopentadienyl)cerium (III) (Ce(MeCp) 3 ) on hydroxylated rutile and anatase TiO 2 surfaces. The hydroxyl saturation coverage on different TiO 2 facets was first addressed. These facets include anatase a-TiO 2 (001) and a-TiO 2 (101) and rutile r-TiO 2 (100) and r-TiO 2 (110). Hydroxyl groups OH and H are initially binding to surface Ti and O atoms, respectively. On a-TiO 2 (001) hydroxyl recombination to form water results in a final coverage of 0.81ML, due to the shortest neighboring HO-H distance on all surfaces. The Gibbs energy is then calculated to elucidate the effect of pressure and temperature on the hydroxylated termination of TiO 2 surfaces. The final hydroxyl coverage is as follows: 0.81ML on a-TiO 2 (001) surface, 1ML on a-TiO 2 (101) and r-TiO 2 (100) surfaces, and 0.75ML on r-TiO 2 (110) surface. Two precursors (Ce(TMHD) 4 and Ce(MeCp) 3 ) are adsorbed on hydroxylated TiO 2 surfaces. After precursor adsorption and relaxation, the surface hydroxyl coverage changes with water formation. After Ce(THMD) 4 adsorbed on r-TiO 2 (100) surface, the hydroxyl coverage is decreased from 1ML to 0.25ML with 12 H 2 O molecules formation. After Ce(MeCp) 3 adsorbed on a-TiO 2 (101) surface, although the hydroxyl coverage is not changed, the hydroxyl orientation is modified, breaking the symmetry. For Ce(TMHD) 4 , direct ligand dissociation is applied to study the mechanism of eliminating the ligands. For Ce(MeCp) 3 , the ligand can be eliminated by hydrogen transfer. The barrier for hydrogen transfer is calculated using climbing image nudged elastic band (CI-NEB) method. The results show that for Ce(MeCp) 3 , the reaction is endothermic on a-TiO 2 (101) surface, but it is overall exothermic on the other three surfaces. The facets play an important role in the eliminating the ligand. We present DFT results on the activity of ceria-modified rutile TiO 2 towards water dissociation and CO 2 activation showing that this heterostructured catalyst can promote both reactions. This work will be important to reveal the mechanism and feasibility of atomic layer deposition of ceria on different TiO 2 surface facets.

Atomic Layer Deposition of Cerium Dioxide Film on TiN and Si Substrates: Structural and Chemical Properties

Structural, chemical and optical properties of cerium dioxide film prepared by atomic layer deposition on TiN and Si substrates

Investigation of Growth, Structural and Optical Properties of CeO2 Nanocrystalline Thin Films Prepared by Pulsed Spray-Evaporation Chemical Vapor Deposition (PSE-CVD)

Changes in the structural and optical properties of CeO2 nanocrystalline films: Effect of film thickness

Deposition of Sm2O3 doped CeO2 thin films from Ce(DPM)4 and Sm(DPM)3 (DPM=2,2,6,6-tetramethyl-3,5-heptanedionato) by aerosol-assisted metal–organic chemical vapor deposition

In Situ X‐Ray Photoelectron Spectroscopy Study of Atomic Layer Deposited Cerium Oxide on SiO2: Substrate Influence on the Reaction Mechanism During the Early Stages of Growth

Growth and Surface Structure of Ti-Doped CeO<sub><i>x</i></sub>(111) Thin Films

Atomic Layer Deposition of CeO2 Film with a Novel Heteroleptic Ce(III) Complex

Properties and morphology of TiN films deposited by atomic layer deposition

Structure and optical properties of TiO2 thin films deposited by ALD method

Ti/Ceox(111) Interfaces Studied by Xps and Stm

DFT Study on Atomic Layer Deposition of Cerium Dioxide on Hydroxylated Titanium Dioxide As Efficient Photocatalyst

Biaxially Textured Ceo2 Seed Layers and Thin Films on Ni Substrates by Chemical Solution Deposition Using Inorganic Cerium Nitrate As A Precursor

Structure and Corrosion Behavior of Sputter Deposited Cerium Oxide Based Coatings with Various Thickness on Al 2024-T3 Alloy Substrates

Spectroscopic Studies of Interfacial Structures of Ceo2-Tio2 Mixed Oxides

Determination of film thicknesses of metal oxides prepared by atomic layer deposition on SBA-15

Structural and electrochemical properties of high quality epitaxial titanium carbide thin films grown by pulsed laser deposition on MgO (111) and Al2O3 (001) substrates

Orientation Competition Growth and Mechanism of SrTiO3 Film on CeO2 Layer

Mechanical and Optical Properties of Cr2O3 Thin Films Grown by Atomic Layer Deposition Method Using Cr(thd)3 and Ozone

Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

Surface Acidity and Properties of TiO2/SiO2 Catalysts Prepared by Atomic Layer Deposition: UV−visible Diffuse Reflectance, DRIFTS, and Visible Raman Spectroscopy Studies