Power Supply Feedback Control of Industrial Giant Target During Magnetic Sputtering

YIN Jin-lang,WANG De-miao,DONG Shu-rong,ZHANG Xing-yi
DOI: https://doi.org/10.3969/j.issn.1002-0322.2006.01.009
IF: 4
2006-01-01
Vacuum
Abstract:Magnetron sputtering process has widely been applied to thin film preparation,during which,the quality of thin film is affected badly by the current stability of target.Analyses the influencing factors on the current stability of a giant target in industrial application,then designs and implements a voltage feedback control system of the target to improve the smoothness of the hysteresis curve of target voltage versus reactive gas flowrate,thus upgrading the voltage controllability.The system has been applied successfully in industrial practice.
What problem does this paper attempt to address?