Abstract:A planar magnetron sputtering apparatus with complex targets has been made for depositing high quality metal films onto various substrates. The apparatus can be used in several configurations such as that for multilayer, interdigitated wedge deposition and co-sputtering. The vacuum chamber contains four pairs of two-element targets and a rotatable substrate holder, which permits eight elements to be deposited onto one substrate without removal of the substrate from the vacuum chamber. A liquid nitrogen trap is used for cooling the substrate. Taking the AlFe system as an example of two-element co-sputtering, amorphous and other metastable phases have been obtained. The complex target co-sputtering technique is a useful method for investigating the formation of crystalline, metastable phases in metallic systems.

Performance of a Planar Magnetron Sputtering Apparatus with Complex Targets