Recent developments and applications in magnetron sputtering
Wanjing Xu
DOI: https://doi.org/10.3969/j.issn.1672-7916.2005.06.002
2005-01-01
Abstract:Magnetron sputtering is a widely used method for thin film deposition in recent years, which makes a great impact on the industrial production and scientific research. Magnetron technology is continuously developing because new advanced films with specific functional properties are needed. The paper will describe the development of magnetron technology and novel technologies such as closed-field unbalanced magnetron sputtering, High-rate magnetron sputtering, sustained self-sputtering, AC or medium frequency sputtering and pulsed sputtering. The application of magnetron sputtering in electronics, optics, surface engineering and electroluminescent component will be shown.
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