Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film
Grzegorz Greczynski,Ivan Petrov,J. E. Greene,Lars Hultman
DOI: https://doi.org/10.1116/1.5121226
2019-12-01
Abstract:Ion irradiation is a key tool for controlling the nanostructure, phase content, and physical properties of refractory ceramic thin films grown at low temperatures by magnetron sputtering. However, in contrast to gas-ion bombardment, the effects of metal-ion irradiation on properties of refractory ceramic thin films have not been extensively studied due to (i) low metal-ion concentrations (a few percents) during standard direct-current magnetron sputtering (DCMS) and (ii) difficulties in separating metal-ion from gas-ion fluxes. Recently, the situation has changed dramatically, thanks to the development of high-power impulse magnetron sputtering (HiPIMS), which provides highly-ionized metal-ion plasmas. In addition, careful choice of sputtering conditions allows exploitation of gas-rarefaction effects such that the charge state, energy, and momentum of metal ions incident at the growing film surface can be tuned. This is possible via the use of pulsed substrate bias, synchronized to the metal-ion-rich portion of each HiPIMS pulse. In this review, the authors begin by summarizing the results of time-resolved mass spectrometry analyses performed at the substrate position during HiPIMS and HiPIMS/DCMS cosputtering of transition-metal (TM) targets in Ar and Ar/N<sub>2</sub> atmospheres. Knowledge of the temporal evolution of metal- and gas-ion fluxes is essential for precise control of the incident metal-ion energy and for minimizing the role of gas-ion irradiation. Next, the authors review results on the growth of binary, pseudobinary, and pseudoternary TM nitride alloys by metal-ion-synchronized HiPIMS. In contrast to gas ions, a fraction of which are trapped at interstitial sites, metal ions are primarily incorporated at lattice sites resulting in much lower compressive stresses. In addition, the closer mass match with the film-forming species results in more efficient momentum transfer and provides the recoil density and energy necessary to eliminate film porosity at low deposition temperatures. Several novel film-growth pathways have been demonstrated: (i) nanostructured N-doped <i>bcc</i>-CrN<sub>0.05</sub> films combining properties typically associated with <i>both</i> metals <i>and</i> ceramics, (ii) fully-dense, hard, and stress-free Ti<sub>0.39</sub>Al<sub>0.61</sub>N, (iii) single-phase cubic Ti<sub>1−<i>x</i></sub>Si<i><sub>x</sub></i>N with the highest reported SiN concentrations, (iv) unprecedented AlN supersaturation in single-phase NaCl-structure V<sub>1−<i>x</i></sub>Al<i><sub>x</sub></i>N, and (v) a dramatic increase in the hardness, due to selective heavy-metal ion bombardment during growth, of dense Ti<sub>0.92</sub>Ta<sub>0.08</sub>N films deposited with no external heating.
physics, applied,materials science, coatings & films