Facilitating Complex Thin Film Deposition by Using Magnetron Sputtering: A Review
Jie Li,Guang-Kun Ren,Jiahui Chen,Xuxuan Chen,Wenjie Wu,Yinke Liu,Xiaohong Chen,Jiangfeng Song,Yuan-Hua Lin,Yan Shi
DOI: https://doi.org/10.1007/s11837-022-05294-0
2022-04-21
JOM
Abstract:In light of the low deposition temperature and high sputtering rate, a magnetron sputtering (MS) technique has been widely used for fabricating various kinds of thin films with special functions. Further, MS has been subsequently developed to cope with the increasing complexities required by film synthesis. In this work, we review a large variety of complex thin films and various advances in the techniques of producing them, combined with typical challenges. From an initial single-target direct current (DC) MS, to a much more advanced configuration with radio frequency (RF) and multi-targets, focusing on specific compound fabrication, the latest techniques can prepare almost all constituents with corresponding targets. More importantly, the unique adaptability, combined with features of low-cost, energy-efficiency, and time-efficiency, means that MS will remain an important technique for depositing high quality thin films in the future.
materials science, multidisciplinary,metallurgy & metallurgical engineering,mining & mineral processing,mineralogy