Preparation of Zirconia/Organosilicone Thin Film by Sol-Gel Method

Jing-juan LU,Xing-zhong GUO,Hui YANG,Rui-jie ZHANG,Jun ZHANG
DOI: https://doi.org/10.3969/j.issn.1001-1625.2006.05.028
2006-01-01
Abstract:With zirconium oxychloride and γ-aminopropyltriethoxysilane(KH-550) as precursor, the hybrid film composed of zirconia and organosilicone was prepared on polycarbonate through co-condensation reactions by sol-gel method. The structure and properties of films were studied by TG/DTA, FTIR, UV-VIS, metallographic microscope and pencil hardness test. The results show that the cross-linked inorganic structure endcapped with organic groups formed on the PC by the co-condensation reaction, whose base backbone is composed of Si—O—Si, Si—O—Zr and Zr—O—Zr network structure. When the molar ratio of KH-550 to zirconium oxychloride is above 2, the transparency and surface morphology are excellent. The proper molar ratio of zirconium oxychloride to water is between 80:1 and 20:1. The hardness of PC increases from 2B to H after coated, apart with a good coating adhesion of films to the substrate.
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