Validity and applicability of triangular potential well approximation in modeling of MOS structure inversion and accumulation layer

Yutao Ma,Litian Liu,Zhiping Yu,Zhijian Li
DOI: https://doi.org/10.1109/16.861589
IF: 3.1
2000-01-01
IEEE Transactions on Electron Devices
Abstract:Two methods are presented to calculate the carrier distribution in MOS inversion and accumulation layer by self-consistent solution of Schrodinger and Poisson equations, One is the fully numerical solution of Schrodinger equation by finite difference method and the other is the analytical solution of Schrodinger equation under triangular potential well approximation. The effective electric field used in the analytical solution is properly determined, Results show that both carrier sheet density and surface potential in inversion layer and accumulation layer can be determined by analytical solution under triangular potential well approximation with sufficiently high accuracy. However, the carrier distribution profile and centroid of mobile charge layer as well as the behavior at the nat-band region, have a large deviation from the numerical results.
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