A discussion on the universality of inversion layer mobility in MOSFET's

Yutao Ma,Litian Liu,Zhijian Li
DOI: https://doi.org/10.1109/16.784197
IF: 3.1
1999-01-01
IEEE Transactions on Electron Devices
Abstract:An obvious discrepancy exists in published research results [1]-[4] concerning the universality of MOS inversion layer electron mobility in nonuniform substrate doping profile cases, By thorough analysis of the data provided in [1] and the parameter extraction method used in [2], it is demonstrated that the discrepancy is simply due to the different definition of depletion layer charge in [1] and the invalid extraction of parameters from experimental data in [2]. Studies in this work show that inversion layer carrier mobility experiences the same universality feature in nonuniform doping substrates as in uniform ones.
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