The Structural and Electric Behavior of SrBi2Ta2O9 Ferroelectric Thin Films with H+ Implantation

JM Zeng,LR Zheng,CL Lin,M Alexe,A Pignolet,D Hesse
DOI: https://doi.org/10.1016/s0375-9601(98)00909-8
IF: 2.707
1999-01-01
Physics Letters A
Abstract:The structural and electrical characteristics of H+-implanted SrBi2Ta2O9 (SBT) ferroelectric thin films were investigated by X-ray diffraction analysis and electrical measurements. 25 keV H+ with doses ranging from 1 × 1014/cm2 to 3 × 1015/cm2 were implanted into the Sol-Gel prepared SBT ferroelectric thin films. The X-ray diffraction patterns of SBT films show that no difference appears in the crystalline structure of H+-implanted SBT films compared with unimplanted films. Ferroelectric properties measurements indicate that both remnant polarization and the coercive electric field of H+-implanted SBT films decrease with increasing the implantation dose. The disappearance of ferroelectricity was found in the H+-implanted SBT films up to a dose of 3 × 1015/cm2. The leakage current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the H+-implanted SBT films were also discussed before and after a recovery process.
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