Effect of In-Situ Applied Electric Field on Structure and Ferroelectric Properties of SrBi 2 Ta 2 O 9 Films

HQ Ling,AD Li,D Wu,T Yu,ZG Liu,NB Ming
DOI: https://doi.org/10.1080/713718292
2002-01-01
Integrated Ferroelectrics
Abstract:SrBi 2 Ta 2 O 9 (SBT) films were prepared on Pt/TiO 2 /SiO 2 /Si and P-Si(100) substrates by metal-organic decomposition. Electric field was in-situ applied on the films during crystallization. It was found that magnitude and direction of the field and the substrate had great effect on structure, morphology and ferroelectric properties of the SBT films. Positive field (assuming the substrates is electrical grounded) enhanced C-axis orientation of the films deposition on Pt/TiO 2 /SiO 2 /Si substrates, while negative field had little effect on it. Meanwhile electric field had no effect on that of the films deposited on Si substrates. The films deposited on Pt/TiO 2 /SiO 2 /Si substrates under 90 V and 120 V applied voltage had good fatigue and retention properties. We think that amount and kind of induced charge in the interface between the film and substrate are main causes of the structure change.
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