Characteristics of SrBi2Ta2O9 Thin Films Prepared by Pulsed Laser Deposition for Non-Volatile Memory Applications

XH Zhu,YM Liu,ZH An,T Zhu,ZC Wu,T Yu,ZG Liu
DOI: https://doi.org/10.1016/s0040-6090(00)01235-9
IF: 2.1
2000-01-01
Thin Solid Films
Abstract:Ferroelectric SrBi2Ta2O9 (SBT) thin films were prepared on Pt/TiO2/SiO2/Si(100) substrates by pulsed laser ablation of SrBi2.2Ta2O9 ceramic target. The ferroelectric properties and microstructure of SBT films were investigated in this work. The SBT films deposited at 650°C exhibited a remnant polarization of 6.6 μC/cm2 and a coercive field of 23 kV/cm at 5 V. Higher leakage current was observed in films deposited at 550°C. Crystallinity of the films was examined by X-ray diffraction patterns and no secondary phases were observed. Furthermore, XRD patterns also indicated a change in orientation from c-axis dominated to randomly polycrystalline, when the deposition temperature was changed from 550 to 650°C. Grains in SBT film show polyhedral morphologies based on planar TEM analysis. The microstructures of grain boundaries in SBT film with c-axis dominated orientation were investigated by high-resolution transmission electron microscopy (HRTEM). The relationship between the leakage current of film and microstructures of grain boundaries is briefly discussed.
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