Abstract:This paper investigates the consequence of the material property and the plasma gas chemistry (herein referred to the plasma gas-feeding species and methods) on the electrode performance in plasma treatments of screen-printed carbon nanotube (CNT) films. Four plasma gases (Ar, O2, SF6, and CHF3) and three gas-feeding methods were examined. The surface morphology, microstructure, and composition of 11 sample groups have been carefully characterized. Tests of the CNT film electrode subjected to gas discharge and field emission show that surface morphology modification is the most influential factor in respect of lowering the onset voltages. In detail, O2/Ar (O2 followed by Ar) and Ar+CHF3+SF6 (mixed three gases) treatments are the best choices for ionization and field emission applications, respectively. The relevant results are even better than that of the samples of aligned CNT films prepared by chemical vapor deposition. The underlying mechanisms are modeled by two opposing processes (etching and coating), which phenomenally produce three competing effects, i.e., CNT protruding, bundle forming, and neo-nanostructure forming. The results and the correct behavior of our model suggest that the plasma gas chemistry is the most fundamental factor in the process of plasma treatments of CNT films.

Effects of plasma treatment on microstructure and electron field emission properties of screen-printed carbon nanotube films

Effect of Ion Impinging on the Microstructure and Field Emission of Carbon Nanotubes

Ar, O2, CHF3, and SF6 plasma treatments of screen-printed carbon nanotube films for electrode applications

Effect of Hydrogen Plasma Treatment on Uniformity of Field Emission from Carbon Nanotube Film

Plasma etching treatment for improving the field emission properties of carbon nanotubes composite emitters

Super-low Turn-on and Threshold Electric Fields of Plasma-Treated Partly Fe-filled Carbon Nanotube Films

Effects Of Corona Discharge On The Surface Structure, Morphology And Properties Of Multi-Walled Carbon Nanotubes

Field Emission Characteristics of Screen-Printed Carbon Nanotubes Cold Cathode by Hydrogen Plasma Treatment

Effect of Surface Treatment on Printed Carbon Nanotube Field Emitters

Post Treatment of Screen-Printed Carbon Nanotubes Emitter by Plasma Etching

Enhancement of Electron Field Emission of Vertically Aligned Carbon Nanotubes by Nitrogen Plasma Treatment

Improving Field Emission Properties of Carbon Nanotubes Film by High-Temperature Sintering and Plasma Bombarding

Enhancement of field emission from hydrogen plasma processed carbon nanotubes

Effect of Hydrogen Treatment on the Field Emission of Amorphous Carbon Film

Enhanced Ferromagnetic Properties of N2 Plasma-Treated Carbon Nanotubes

Plasma etching carbon nanotube arrays and the field emission properties

Comparison on Different Post-treatment Methods of Printed Carbon Nanotube Films for Enhanced Field Emission

Effects of Argon Plasma Treating on Surface Morphology and Gas Ionization Property of Carbon Nanotubes

Improvement of field emission properties from screen-printed CNTs cathodes by heat treatment in a C2H2/H2 gas mixture

Plasma Composition During Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanotubes

Effects of Plasma and Acid Treatment on the Dispersion of Carbon Nanotubes in Liquids