Abstract:In this study, to explore the impact of nitrogen on chemical composition, morphology, microstructure, as well as intrinsic stress of titanium films, nitrogen-doped titanium thin films prepared by direct current reactive magnetron sputtering, with different ratio of nitrogen doping into the Argon gas, have been characterized. After the check of grazing incidence X-ray reflectometry (GIXR), thickness of all samples were ensured to be approximately 40 nm. Using the X-ray photoelectron spectroscopy (XPS) combined with X-ray diffraction (XRD), nitrogen atoms were found to transform Ti crystals from the hexagonal close-packed (hcp) <math>α</math>-Ti phase with Ti(100) and Ti(002) orientation to the face-centered cubic(fcc) <math>δ</math>-TiN phase with TiN(111) and TiN(200) orientations, accompanied by the formation of <math>TiO2</math> and TiON. XRD diffraction patterns further revealed the expansion of the TiN lattice and the intensity transform of TiN(111) and TiN(200). Atomic force microscopy (AFM) results indicated that the surface roughness declined continuously. A compressive stress was found to increase gradually with increasing nitrogen content. Variations in stress are caused by the expansion of the crystal lattice. It is obvious that the incorporation of nitrogen into titanium films can effectively reduce the roughness, but it will result in an increase in the compressive stress. Therefore, an appropriate nitrogen partial pressure should be chosen to control the intrinsic stress while reducing the roughness effectively.

Research on the Resistivity and Infrared Emissivity of Nonstoichiometric TiCrN Films

Evolutions of the Microstructure and Properties of the (CrMoNbTaZr)NX Films Prepared by Reactive Magnetron Sputtering: Effects of Stoichiometry and Crystallinity

Crystallization and Oxidation Behaviors of Cr-Si-Ni-N Resistive Films

Effects of Nitrogen Content on Microstructures and Mechanical Behavior of (titacrmonb)nx Films

Influence of Substrate and Ar/N 2 Gas Flow Ratio on Structural, Optical and Electrical Properties of TiN Thin Films Synthetized by DC Magnetron Sputtering

TiNx Thin Films for Energy-Saving Application Prepared by Atmospheric Pressure Chemical Vapor Deposition

Characterization and In-situ Monitoring of Sub-stoichiometric Adjustable Tc Titanium Nitride Growth

Structure, Electrical and Optical Properties of TiNx Films by Atmospheric Pressure Chemical Vapor Deposition

Study on the Modification of Tin and Crn Binary Films

Substrate temperature effects on infrared emissivity of TiN x films

Effects of nitrogen composition on the resistivity of reactively sputtered TaN thin films

Microstructural and Electrical Resistivity of TiN Electrode Films Prepared by Direct Current (DC) Reactive Magnetron Sputtering

Influence of Nitrogen Content and Bias Voltage on Residual Stress and the Tribological and Mechanical Properties of CrAlN Films

Effects of Nitrogen Content on the Structure and Mechanical Properties of (Al0.5CrFeNiTi0.25)Nx High-Entropy Films by Reactive Sputtering

Structural and Mechanical Properties of Multi-Element (alcrmotatizr)nx Coatings by Reactive Magnetron Sputtering

Evolution of chemical, structural, and mechanical properties of titanium nitride thin films deposited under different nitrogen partial pressure

Influence of the Nitrogen Flux Ratio on the Structural, Morphological and Tribological Properties of TiN Coatings

Effects of nitrogen content on structure and mechanical properties of multi-element (AlCrNbSiTiV)N coating

The microstructure and mechanical properties of Ti(CoCr)N films produced by DC magnetron sputtering

Nitride Films Deposited from an Equimolar Al–Cr–Mo–Si–Ti Alloy Target by Reactive Direct Current Magnetron Sputtering

Structure, Composition and Mechanical Properties of Reactively Sputtered (tivcrtaw)nx High-Entropy Films