Abstract:Low-temperature growth of diamond films using the chemical vapor deposition (CVD) method is not so widely reported and its initial periods of nucleation and growth phenomenon are of particular interest to the researchers. Four sets of substrates were selected for growing diamond films using linear antenna microwave plasma-enhanced CVD (LA-MPCVD). Among them, silicon and sapphire substrates were pre-treated with detonation nanodiamond (DND) seeds before diamond growth, for enhancement of its nucleation. Carbon nanotube (CNT) films on Si substrates were also used as another template for LA-MPCVD diamond growth. To enhance diamond nucleation during CVD growth, some of the CNT films were again pre-treated by the electrophoretic deposition (EPD) of diamond nanoparticles. All these substrates were then put inside the LA-MPCVD chamber to grow diamond films under variable processing conditions. Microwave input powers (1100–2800 W), input power modes (pulse or continuous), antenna-to-stage distances (5–6.5 cm), process gas recipes (with or without CO2), methane gas percentages (3%–5%), and deposition times (11–120 min) were altered to investigate their effect on the growth of diamond film on the pre-treated substrates. The substrate temperatures were found to vary from as low as 170 °C to a maximum of 307 °C during the alteration of the different processing parameters. Contrary to the conventional MPCVD, it was observed that during the first hour of LA-MPCVD diamond growth, DND seeds and the nucleating structures do not coalesce together to make a continuous film. Deposition time was the most critical factor in fully covering the substrate surfaces with diamond film, since the substrate temperature could not become stable during the first hour of LA-MPCVD. CNTs were found to be oxidized rapidly under LA-MPCVD plasma conditions; therefore, a CO2-free process gas recipe was used to reduce CNT burning. Moreover, EPD-coated CNTs were found to be less oxidized by the LACVD plasma during diamond growth.

Etching Kinetics of Nanodiamond Seeds in the Early Stages of CVD Diamond Growth

Size dependent etching of nanodiamond seeds in the early stages of CVD diamond growth

Enhanced Nucleation and Growth of Diamond Film on Si by CVD Using a Chemical Precursor

A Kinetic Model for the Initial Growth of Diamond Films

Early Periods of Low-Temperature Linear Antenna CVD Nucleation and Growth Study of Nanocrystalline Diamond Films

Role Of Nucleation In Nanodiamond Film Growth

Early stages of polycrystalline diamond deposition: Laser reflectance at substrates with growing nanodiamonds

Impact of seed density on continuous ultrathin nanodiamond film formation: an analytical approach

Diamond Seed Size and the Impact on Chemical Vapor Deposition Diamond Thin Film Properties

Diamond Nucleation on Unscratched Silicon Substrates Coated with Various Non-Diamond Carbon Films by Microwave Plasma-Enhanced Chemical Vapor Deposition

Vertical-Substrate MPCVD Epitaxial Nanodiamond Growth

Evidence of Gas Phase Nucleation of Nano Diamond in Microwave Plasma Assisted Chemical Vapor Deposition

Vapor phase nucleation and sedimentation of dispersed nanodiamonds by MPCVD

Quantum Chemistry Model of Surface Reactions and Kinetic Model of Diamond Growth: Effects of CH3 Radicals and C2H2 Molecules at Low-Temperatures CVD

Diamond Films and Particles Growth in Hydrogen Microwave Plasma with Graphite Solid Precursor: Optical Emission Spectroscopy Study

Ultrathin Nanocrystalline Diamond Films with Silicon Vacancy Color Centers via Seeding by 2 nm Detonation Nanodiamonds

Evidence of gas phase nucleation of nanodiamond in microwave plasma assisted chemical vapor deposition

Nitrogen Adsorption Induced Surface Kinetics Changes of Diamond Growth by Microwave Plasma Cvd

Investigation of Diamond Nucleation under Very Low Pressure in Chemical Vapor Deposition

Express in situ measurement of epitaxial CVD diamond film growth kinetics

Fast, Efficient Tailoring Growth of Nanocrystalline Diamond Films by Fine-Tuning of Gas-Phase Composition Using Microwave Plasma Chemical Vapor Deposition